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Luminescent Technologies provides the world's most advanced lithography enhancement solutions to the global semiconductor industry. Our groundbreaking Inverse Lithography Technology (ILT) addresses the most pressing issues facing semiconductor manufacturers today: smaller process windows, increasing design constraints, and longer turnaround times resulting from ever smaller sub-wavelength features.

Luminescent Technologies has pioneered the commercial development of ILT. Unlike optimal-proximity correction (OPC) approaches that find narrowly acceptable mask patterns using incomplete heuristics, ILT uses sophisticated mathematical methods to rigorously solve for the optimal photomask. The result: precise on-wafer pattern fidelity, wider process windows, shorter time to silicon, accelerated yield ramps, superior design tolerance and favorable IC economics. At Luminescent Technologies, we're enabling lithography technology. Discover the possibilities.


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	· For a general overview and validation of Luminescent’s Inverse Lithography Technology, please see this paper presented at SPIE 2008.

	· To learn about applying ILT as a powerful DFM tool, please see this paper presented at SPIE 2008.

	· To learn about Luminescent’s advanced 3-D modelling capability, please see this paper presented at SPIE 2008.

	· To see an example of an application of ILT by a customer on a real 55 nm product development, please see this paper presented at SPIE 2008.

	· To learn how you can use “MEEF-aware” process window analysis to improve your yield, please see this paper presented at PMJ 2008, and this paper presented at BACUS 2008.