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Luminescent provides the world's most advanced lithography enhancement solutions to the global
semiconductor industry. Our groundbreaking Inverse Lithography Technology (ILT) addresses
the most pressing issues facing semiconductor manufacturers today: smaller process windows,
increasing design constraints, and longer turnaround times resulting from ever smaller sub-wavelength features.
Luminescent has pioneered the commercial development of ILT. Unlike optimal-proximity
correction (OPC) approaches that find narrowly acceptable mask patterns using incomplete
heuristics, ILT uses sophisticated mathematical methods to rigorously solve for the optimal
photomask. The result: precise on-wafer pattern fidelity, wider process windows, shorter time to
silicon, accelerated yield ramps, superior design tolerance and favorable IC economics.
At Luminescent, we're enabling lithography technology. Discover the possibilities.
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| Recent Publications |
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For a general overview and validation of Luminescent’s Inverse Lithography Technology, please see
this paper presented at SPIE 2008.
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To learn about applying ILT as a powerful DFM tool, please see
this paper presented at SPIE 2008.
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To learn about Luminescent’s advanced 3-D modelling capability, please see
this paper presented at SPIE 2008.
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To see an example of an application of ILT by a customer on a real 55 nm product development, please see
this paper presented at SPIE 2008.
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To learn how you can use
“MEEF-aware” process window analysis to improve your yield, please see
this paper presented at PMJ 2008.
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