LAIPH™
A suite of computational defect management solutions complement expensive inspection, metrology and repair equipment, enabling them to operate at higher capability and efficiency, meeting the requirements of ILT masks.
Synopsys, Inc. Acquired Luminescent's Computational Lithography and Mask Synthesis Business
On February 15, 2012, Synopsys, Inc. Acquired Luminescent's computational lithography and mask synthesis business. Included in the acquisition are the Inverse Explorer (IE) and the Inverse Synthesizer (IS) products, their associated IP, and Luminescent's lithography and mask synthesis customer licenses and obligations. Concurrent with the acquisition, the Luminescent employees responsible for R&D and applications engineering supporting the acquired products transferred to Synopsys, Inc.
We are grateful to our long term customers who have helped Luminescent pioneer inverse lithography technology by adopting it in their mass product designs. Luminescent will now focus exclusively on computational metrology and inspection, where we have been a pioneer and a leader since 2009.
Moris Kori
President & CEO
PUBLICATIONSREAD MORE
2012
SPIE 2012 - Advanced Lithography Symposium
Accurate optical CD profiler based on specialized finite element method [8324-24]