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ILT can be the future realized. These papers reveal how Luminescent’s innovative technology is being received by the industry.
Photomask Japan 2008
Minimize MEEF in Low K1 Lithography
Guangmin Xiao, Tom Cecil, Linyong Pang, Bob Gleason, John McCarty, Luminescent Technologies, Inc.
SPIE Advanced Lithography Symposium 2008
Validation of Inverse Lithography Technology (ILT) and Its Adaptive SRAF at Advanced Technology Nodes
Linyong Pang, Ph.D., Grace Dai, Tom Cecil, Ph.D., Thuc Dam, Ph.D., Ying Cui, Ph.D., Peter Hu, Ph.D., Dongxue, Ph.D., Ki-Ho Baik, Ph.D., Danping Peng, Ph.D.
Luminescent Technologies, Inc.
Evaluation of Inverse Lithography Technology for 55nm-node memory device
Byung-ug cho, Sung-woo Ko, Jae-seung Choi, Cheol-Kyun Kim, Hyun-jo Yang and DongGyu Yim, Hynix Semiconductior, Inc. Kerea
David Kim, Bob Gleason, KiHo Baik, Ying Cui, Thuc Dam and Linyong Pang - Luminescent Technologies, USA
Validation and Application of a Mask Model for Inverse Lithography
Thuc H. Dam, Xin Zhou, Dongxue Chen, Anthony Adamov, Danping Peng and Bob Gleason - Luminescent Technologies, USA
Inverse Lithograph as a DFM Tool: Accelerating Design Rule Development with Model-Based Assist Feature Placement, Fast Optical Proximity Correction and Lithographic Hotspot Detection
Steve Prins, James Blatchford, Simon Chang, Lewis Flanagin, Scott Jessen, Sean O'Brien - Texas Instrucments, Inc., DAllas, TX
Guangming Xiao, Timothy Lin, Thuc H. Dam, and Bob Gleason - Luminescent Technologies, Palo Alto, CA
BACUS 2007 Photomask Technology Symposium
Inverse Lithography Technology (ILT) Keep the balance between SRAF and MRC at 45 and 32-nm
Linyong Pang, Yong Liu, Kresimir Mihic, Thomas Cecil, Dan Abrams, Luminescent Technologies, Inc.
Photomask Japan 2007
Inverse Lithography Technology (ILT): A Natural Solution for Model-based SRAF at 45nm and 32nm
Linyong Pang, Yong Liu, Daniel Abrams, Luminescent Technologies, Inc.
Application of Sigma7500 pattern generator to X Architecture and 45-nm generation mask making
Ming-Jiun Yao, Tzu-Yi Wang, Chia-Jen Chen, Hsin-Chang Lee and Yao-Chang Ku, Taiwan Semiconductor Manufacturing Company, Ltd.
Semicon China, International Semiconductor Technology Conference (ISTC) 2007
Inverse Lithography Technology (ILT) and Its Readiness for Production in Advanced Technology Nodes
Linyong Pang, Yong Liu, Dan Abrams, Luminescent Technologies, Inc.
SPIE 2007 Microlithography Conference
RAF Placement and Sizing Using Inverse Lithography Technology
Timothy Lina, Frederic Robertb, Amandine Borjonb, Gordon Russella, Catherine Martinellib, Andrew Moorea, Yves Rodyb
(a) Luminescent Technologies, Inc., 2471 E. Bayshore Road, Palo Alto, CA 94303
(b) Crolles2 Alliance, 860 Rue Jean Monnet, 38920 Crolles, France
Semicon Japan 2006
Inverse Lithography Technology (ILT) and its Latest Development -Enabling 45nm Generation with Dry Steppers
Linyong Pang, Yong Liu, Dan Abrams, Luminescent Technologies, Inc.
BACUS 2006 Photomask Technology Symposium
Inverse Lithography Technology at Low k1: Placement and Accuracy of Assist Features
Andrew Moore, Timothy Lin, Yong Liu, Gordon Russell, Linyong Pang, Daniel Abrams, Luminescent Technologies, Inc.
Photomask Japan 2006
Inverse Lithography Technology(ILT), What is the Impact to Photomask Industry?
Linyong Pang, Daniel Abrams, Luminescent Technologies, Inc.
SPIE 2006 Microlithography Conference
Fast Inverse Lithography Technology
Daniel S. Abrams, Linyong Pang, Luminescent Technologies, Inc.
Pushing the Lithography Limit- Applying Inverse Lithography Technology (ILT) at the 65nm Generation
Chi-Yuan Hung, Bin Zhang, Eric Guo, Semiconductor International Manufacturing Corporation;
Yong Liu, Kechang Wang, Grace Dai, Luminescent Technologies, Inc.
Inverse Lithography Technology at Chip Scale
Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, United Microelectronic Corp.;
Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Xilinx Inc.;
Orson Lin, Jason Lin, Toppan Chunghwa Electronics;
Yong Liu and Linyong Pang, Luminescent Technologies, Inc.
Enhancing DRAM Printing Process Window by Using Inverse Lithography Technology (ILT)
Chih-Wei Chu, Becky Tsao, Karl Chiou, Snow Lee, Jerry Huang, ProMOS Technologies;
Yong Liu, Timothy Lin, Andrew Moore, Linyong Pang, Luminescent Technologies, Inc.
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BACUS 2005 Photomask Technology Symposium
Laser and E-beam Mask-to-Silicon with Inverse Lithography Technology (ILT)
Linyong Pang, Nader Shamma (currently at Cypress Semiconductor), Paul Rissman, Dan Abrams, Luminescent Technologies, Inc.
First 65nm Tape-Out Using Inverse Lithography Technology (ILT)
Chi-Yuan Hung, Bin Zhang, Deming Tang, Eric Guo, Semiconductor International Manufacturing Corporation; Linyong Pang, Yong Liu, Andrew Moore, Kechang Wang, Luminescent Technologies, Inc.
Real-World Impact of Inverse Lithography Technology
Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Xilinx Inc.;
Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, United Microelectronic Corp.;
Orson Lin, Jason Lin, Toppan Chunghwa Electronics;
Yong Liu, Linyong Pang, Luminescent Technologies, Inc.
Inverse Lithography Technology Principles in Practice: Unintuitive Patterns
Yong Liu, Dan Abrams, Linyong Pang, Andrew Moore, Luminescent Technologies, Inc
Manufacturability Study of Masks Created by Inverse Lithography Technology (ILT)
Patrick M. Martin, C. J. Progler, G, Xiao, R. Gray, Photronics Inc.;
L. Pang, Y. Liu, Luminescent Technologies, Inc.
Inverse Lithography Technology: Verification of SRAM Cell Pattern
Artur Balasinski, Nader Shamma, Hee-hong Yang, Cypress Semiconductor
Andrew Moore, Timothy Lin, Luminescent Technologies, Inc.
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