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ILT can be the future realized. These papers reveal how Luminescent's innovative technology is being received by the industry.
SPIE 2006 Microlithography Conference
Pushing the Lithography Limit- Applying Inverse Lithography Technology (ILT) at the 65nm Generation -
Chi-Yuan Hung, Bin Zhang, Eric Guo, Semiconductor International Manufacturing Corporation;
Yong Liu, Kechang Wang, Grace Dai, Luminescent Technologies, Inc.
Inverse Lithography Technology at Chip Scale
Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, United Microelectronic Corp.;
Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Xilinx Inc.;
Orson Lin, Jason Lin, Toppan Chunghwa Electronics;
Yong Liu and Linyong Pang, Luminescent Technologies, Inc.
Enhancing DRAM Printing Process Window by Using Inverse Lithography Technology (ILT) -
Chih-Wei Chu, Becky Tsao, Karl Chiou, Snow Lee, Jerry Huang, ProMOS Technologies;
Yong Liu, Timothy Lin, Andrew Moore, Linyong Pang, Luminescent Technologies, Inc.
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